Control and Modify
Patterns
You can control and modify feature patterns in the following ways:
Use the Geometry
pattern option to make exact patterned and mirrored copies
of features, and to improve system performance when using patterned and
mirrored features.
Use the Vary
sketch option to adjust the profile of the patterned feature
based on its dimensions and relations to other features.
Use a mathematical Equation to calculate values
that define the pattern.
Use edit Seed Feature to modify the original
feature of a pattern or mirrored feature based on a single feature.
Use Delete Pattern Instances to remove
selected instances in a pattern.
Modify the Curve
method and the Alignment method
when applying curve-driven
patterns.
Pattern
instances inherit the visual properties of the original feature when you
select Propagate Visual Properties
in the PropertyManager.