Control and Modify Patterns
You can control and modify feature patterns in the following ways:
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Use the Geometry pattern option to make exact patterned and mirrored copies of features, and to improve system performance when using patterned and mirrored features.
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Use the Vary sketch option to adjust the profile of the patterned feature based on its dimensions and relations to other features.
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Use a mathematical Equation to calculate values that define the pattern.
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Use edit Seed Feature to modify the original feature of a pattern or mirrored feature based on a single feature.
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Use Delete Pattern Instances to remove selected instances in a pattern.
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Modify the Curve method and the Alignment method when applying curve-driven patterns.
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Pattern instances inherit the visual properties of the original feature when you select Propagate Visual Properties in the PropertyManager.