Control and Modify Patterns

You can control and modify feature patterns in the following ways:

• Use the Geometry pattern option to make exact patterned and mirrored copies of features, and to improve system performance when using patterned and mirrored features.

• Use the Vary sketch option to adjust the profile of the patterned feature based on its dimensions and relations to other features.

• Use a mathematical Equation to calculate values that define the pattern.

• Use edit Seed Feature to modify the original feature of a pattern or mirrored feature based on a single feature.

• Use Delete Pattern Instances to remove selected instances in a pattern.

• Modify the Curve method and the Alignment method when applying curve-driven patterns.

• Pattern instances inherit the visual properties of the original feature when you select Propagate Visual Properties in the PropertyManager.