Symmetric |
Creates a
symmetrical pattern in Direction
2 using the seed feature and the Direction 1 parameters.

|
Pattern
Direction |
Sets the direction
for the Direction 2 pattern.
Select a linear edge, line, axis, dimension, planar faces and
surfaces, conical faces and surfaces, circular edges, and reference
planes. |
Spacing and instances |
Independently sets
the instance number and spacing.
Spacing
|
Sets the spacing between pattern
instances for Direction
1.
|
Number of Instances
|
Sets the number of pattern instances
for Direction 1.
This number includes the original features or
selections.
|
|
Offset from reference |
Sets the instance
number and spacing based on selected reference geometry.
Reference Geometry
|
Sets the reference geometry that
controls the pattern.
|
Offset distance
|
Sets the distance of the last pattern
instance from the reference geometry.
|
Reverse offset direction
|
Reverses the direction that the pattern
is offset from the reference geometry.
|
Centroid
|
Calculates the offset distance from the
reference geometry to the centroid of the patterned
feature.
|
Selected reference
|
Calculates the offset distance from the
reference geometry to selected seed feature
geometry.
|
Seed Reference
|
Sets which seed feature geometry the
offset distance is calculated from.
|
|
Pattern seed only |
Creates a linear
pattern in Direction 2 by
using the seed features only, without replicating the pattern
instances of Direction 1.
 |
 |
Pattern seed only
option selected. The seed feature only replicates
in Direction
2. |
Pattern seed only
option cleared. The entire linear pattern
replicates in Direction
2. |
|